Which statement about dust residues is accurate?

Which statement about dust residues is accurate?

• A. Dust application is usually ready-to-use, no mixing.
• B. Dust applications require continuous calibration.
• C. Dust never leaves any residue.
• D. Dust leaves a residue that sometimes requires cleaning.

Answer: (D)

Dusts are dry insecticides that settle from the application and can cling to surfaces, walls, and cracks. This settling leaves a residue—often a fine film or visible dust—that can persist after treatment. Because of that residue, cleanup is sometimes needed to remove excess material, prevent tracking, and reduce exposure risk. That’s why the statement dust leaves a residue that sometimes requires cleaning is the accurate one. The other ideas don’t fit as the main point: while some dust products are ready-to-use and don’t require mixing, that describes how the product is packaged rather than what happens after application. Continuous calibration isn’t typically described as an ongoing requirement for dust residues, and claiming that dust never leaves any residue contradicts how dry powders behave, since they inherently settle and leave particles behind.

Dusts are dry insecticides that settle from the application and can cling to surfaces, walls, and cracks. This settling leaves a residue—often a fine film or visible dust—that can persist after treatment. Because of that residue, cleanup is sometimes needed to remove excess material, prevent tracking, and reduce exposure risk. That’s why the statement dust leaves a residue that sometimes requires cleaning is the accurate one.

The other ideas don’t fit as the main point: while some dust products are ready-to-use and don’t require mixing, that describes how the product is packaged rather than what happens after application. Continuous calibration isn’t typically described as an ongoing requirement for dust residues, and claiming that dust never leaves any residue contradicts how dry powders behave, since they inherently settle and leave particles behind.